The Modified Chemical Vapor Deposition Process in a Concentric Annulus: An Extension for Focused High-Rate Deposition

High Rate Deposition of Hydrogenated Amorphous Silicon Using Microwave Plasma Chemical Vapor Deposition Process

High-rate and wide-area deposition of epitaxial Si films by mesoplasma chemical vapor deposition

Homoepitaxial Si films have been deposited at a high rate of 200 nm s-1 over a wide area of 20 mm × 80 mm by cluster-assisted mesoplasma chemical vapor deposition (MPCVD) on a moving substrate. The obtained epitaxial Si films exhibited a uniform roughness of 0.1-0.3 nm (1 × 1 μm2) and a Hall mobility of ∼240 cm2 V-1 s-1. The results suggested that under the MPCVD the deposition precursors forme...

Issues in Process Planning for Laser Chemical Vapor Deposition

Laser Chemical Vapor Deposition (LCVD) is a promising rapid prototyping and manufacturing process that deposits metals and ceramics by local heating of a substrate with a laser. Even though many LCVD process planning characteristics are shared with those of more common Solid Freeform Fabrication (SFF) technologies, LCVD process planning requires new efforts due to its unique characteristics. Un...

Catalyst Role in Chemical Vapor Deposition (cvd) Process: a Review

The article describes significant role of catalyst in the deposition of various materials on different substrates surface via Chemical vapor deposition (CVD) process. CVD is a complex process of depositing thin coatings on a substrate surface via chemical reactions of gaseous materials. It is a useful process to produce materials of high purity, density and strength. It has emerged as a novel m...

Real-time growth rate metrology for a tungsten chemical vapor deposition process by acoustic sensing

An acoustic sensor, the Leybold Inficon ComposerTM, was implemented downstream to a production-scale tungsten chemical vapor deposition cluster tool for in situ process sensing. Process gases were sampled at the outlet of the reactor chamber and compressed with a turbomolecular pump and mechanical pump from the sub-Torr process pressure regime to above 50 Torr as required for gas sound velocity...